Modifications of an Internal Friction Apparatus for the Study of Dislocation Motion in Semiconductors

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Periodical:

Defect and Diffusion Forum (Volumes 206-207)

Edited by:

D.J. Fisher

Pages:

175-178

DOI:

10.4028/www.scientific.net/DDF.206-207.175

Citation:

T. Tondellier et al., "Modifications of an Internal Friction Apparatus for the Study of Dislocation Motion in Semiconductors", Defect and Diffusion Forum, Vols. 206-207, pp. 175-178, 2002

Online since:

July 2002

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$35.00

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