3D-Simulation of Void Formation, Growth and Migration under Electromigration

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Abstract:

The 3D Monte Carlo scheme is proposed for simulation of simultaneous self-consistent current redistribution, surface diffusion, drift and void migration and coalescence at the interface metal/dielectric. Results of simulation as well as simple phenomenological model demonstrate a possibility of trapping at and migration along the grainboundaries (GBs). Critical size of “detrapping” after coalescence has been estimated.

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Defect and Diffusion Forum (Volumes 237-240)

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1306-1311

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April 2005

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© 2005 Trans Tech Publications Ltd. All Rights Reserved

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