For Libraries For Publication Open Access Downloads About Us Contact Us
Abstracts
Si/HfO2: Interdiffusion
a.237
Si/SiGe: Dislocations
a.238
Si/SiO2: B Diffusion and Interface Defects
a.239
Si/SiO2: Point Defects
a.240
 Si-Ni[l]: Ni Diffusion
a.241
SiC: B Diffusion
a.242
 SiC: Cu Diffusion
a.243
SiC: H Diffusion
a.244
SiC: I Diffusion and Ion Implantation
a.245

 Si-Ni[l]: Ni Diffusion

Page: A241

© 2025 Trans Tech Publications Ltd. All rights are reserved, including those for text and data mining, AI training, and similar technologies. For open access content, terms of the Creative Commons licensing CC-BY are applied.
Scientific.Net is a registered trademark of Trans Tech Publications Ltd.