Characterization of Intermetallic Layer with Nanoresolution Using X-Ray Standing Wave Technique

Csaba Cserháti; Z. Erdélyi; Z. Balogh; Lajos Daróczi; A. Csik; G.A. Langer; M. Varga; I. Zizak; A. Erko; Dezső L. Beke

doi:10.4028/www.scientific.net/DDF.289-292.369

Paper Titles

First Study of Oxygen Diffusion in a ZnO - Based Commercial Varistor
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Dynamics of Mobile Oxygen Ions in Disordered Pyrochlore-Type Oxide-Ion Conductors
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Formation of Amorphous Graded Structure in Bi₃Pb₇ Intermetallic Compounds under Strong Gravitational Field
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Triple-Defect B2 Binary Intermetallics: Bragg-Williams Solution and Monte Carlo Simulations
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Characterization of Intermetallic Layer with Nanoresolution Using X-Ray Standing Wave Technique
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Diffusion of Titanium and Nickel in B2 NiTi
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Growth Mechanism vs Matter Transport in Thermally Growing Oxides on High Temperature Materials: A Brief Survey Based on the Case Study of Alumina Formers
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Characterisation of the Oxide/Metal Interface of Fluorine Treated Titanium Aluminides
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Diffusion of Oxygen in Thermally Grown Oxide Scales
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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 289-292Characterization of Intermetallic Layer with...

Characterization of Intermetallic Layer with Nanoresolution Using X-Ray Standing Wave Technique

Abstract:

X-ray standing wave technique has been used to measure the kinetics of CoSi intermetallic phase growth in a-Si/Co/a-Si sandwich structure. The a-Si/Co/a-Si arrangement were placed into a waveguide structure formed by two Ta films. X-ray fluorescence and extended X-ray absorption fine structure analysis has been used in a combination with X-ray standing wave technique for depth profiling with sub-nanometer resolution of specimens annealed at 493K for different annealing time. The position and the thickness of the growing CoSi intermetallic phase have been monitored.