Paper Titles

A Computer-Simulated Random-Walk Analysis of Diffusion in Dislocations
p.1

Oxygen Diffusion in Uranium Oxide an Overview
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Abstracts: Semiconductors, Halides, Oxides, Varios Ionic Substances, Carbides
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Abstracts: Carbides, Hydrides, Silicdes, Sulfides, Miscellaneous Substances, Non-Metallic Liquids, Metals and Alloys
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Abstracts: General References
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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vol. 32A Computer-Simulated Random-Walk Analysis of...

A Computer-Simulated Random-Walk Analysis of Diffusion in Dislocations

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Defect and Diffusion Forum Vol. 32

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Periodical:

Defect and Diffusion Forum (Volume 32)

Pages:

1-8

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.32.1

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Online since:

January 1983

Authors:

Graeme E. Murch

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© 1983 Trans Tech Publications Ltd. All Rights Reserved

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