Paper Titles

A Computer-Simulated Random-Walk Analysis of Diffusion in Dislocations
p.1

Oxygen Diffusion in Uranium Oxide an Overview
p.9

Abstracts: Semiconductors, Halides, Oxides, Varios Ionic Substances, Carbides
p.21

Abstracts: Carbides, Hydrides, Silicdes, Sulfides, Miscellaneous Substances, Non-Metallic Liquids, Metals and Alloys
p.101

Abstracts: General References
p.155

HomeDefect and Diffusion ForumDefect and Diffusion Forum Vol. 32Abstracts: Semiconductors, Halides, Oxides, Varios...

Abstracts: Semiconductors, Halides, Oxides, Varios Ionic Substances, Carbides

Article Preview

Abstract:

You might also be interested in these eBooks

Defect and Diffusion Forum Vol. 32

Info:

Periodical:

Defect and Diffusion Forum (Volume 32)

Pages:

21-100

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.32.21

Citation:

Cite this paper

Online since:

January 1983

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 1983 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: