Elaboration and Characterization of in Doped TiO₂ Thin Films

Abstract:

Undoped and indium (In) doped TiO₂ thin films were deposited by sol-gel method onto glass substrates. Structural, optical and electrical properties of films were studied. X-rays diffraction patterns showed that the TiO₂ films consist of anatase phase. AFM images revealed that the surface roughness of In:TiO₂ films is smoother than that of undoped TiO₂ films. UV–Vis transmittance results showed TiO₂ films have significant optical absorption in the region of 300–350 nm and are fully transparent in the visible. Both film thickness and refraction index in dependence on the fraction of In doping are derived from TE and TM optical guided modes excited in a prism coupler. The optical gap E_g decreases from 3.50 eV for undoped TiO₂ film to 3.43 eV at 2 at.% In doping and then increases for doping with indium at 10 at.%. The electrical characterization shows a maximum electrical conductivity of 2.7 (S/cm) obtained for the film doped with 10 at.% In.

• Periodical: Defect and Diffusion Forum (Volume 397)
• Pages: 59-68
• DOI: https://doi.org/10.4028/www.scientific.net/DDF.397.59
• Online since: September 2019
• Authors: Faouzi Hanini*, Abderrahmane Bouabellou, Yassine Bouachiba, Adel Taabouche, Fouad Kermiche, Mohamed Mahtali, Zahia Daas
• Keywords: Conductivity, In-Doped TiO₂, Morphology, Optical Properties, Waveguide

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