Low Temperature Volume and Dislocation Diffusion of Homovalent Impurities in Tungsten

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Periodical:

Defect and Diffusion Forum (Volumes 66-69)

Edited by:

F.J. Kedves and D.L. Beke

Pages:

889-894

DOI:

10.4028/www.scientific.net/DDF.66-69.889

Citation:

S.M. Klotsman et al., "Low Temperature Volume and Dislocation Diffusion of Homovalent Impurities in Tungsten", Defect and Diffusion Forum, Vols. 66-69, pp. 889-894, 1990

Online since:

January 1991

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$35.00

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