Effect of Microstructure on Diffusion Barrier Capability of RF-Sputtered Titanium and Zirconium Nitride Films

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Periodical:

Defect and Diffusion Forum (Volumes 95-98)

Edited by:

M. Koiwa, K. Hirano, H. Nakajima and T. Okada

Pages:

667-672

DOI:

10.4028/www.scientific.net/DDF.95-98.667

Citation:

S. Maruno et al., "Effect of Microstructure on Diffusion Barrier Capability of RF-Sputtered Titanium and Zirconium Nitride Films", Defect and Diffusion Forum, Vols. 95-98, pp. 667-672, 1993

Online since:

January 1993

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