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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 95-98Effect of Microstructure on Diffusion Barrier...

Effect of Microstructure on Diffusion Barrier Capability of RF-Sputtered Titanium and Zirconium Nitride Films

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Diffusion in Materials - DIMAT 1992

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Periodical:

Defect and Diffusion Forum (Volumes 95-98)

Pages:

667-672

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.95-98.667

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Online since:

January 1993

Authors:

S. Maruno, P. Jin, I. Sakamoto

Keywords:

Diffusion Barrier, Microstructure, Sputtering, Thin Film, Titanium Nitride TiN, ZrN

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© 1993 Trans Tech Publications Ltd. All Rights Reserved

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