Preparation and Characterization of nc-(Ti,Al)N and h-AlN Nanocrystalline Deposited by Plasma CVD Techniques

K. Moto; Stan Veprek

doi:10.4028/www.scientific.net/JMNM.23.219

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Preparation and Characterization of nc-(Ti,Al)N and h-AlN Nanocrystalline Deposited by Plasma CVD Techniques
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Preparation and Characterization of nc-(Ti,Al)N and h-AlN Nanocrystalline Deposited by Plasma CVD Techniques

Abstract:

As alternative to TiN based material, nc-(Ti1-xAlx)N and h-AlN were deposited on steel substrate using plasma CVD technique and characterized by means of XRD, XPS, EDX. The effect of Al substitution can be shown by the decrease of the lattice parameters of TiN as the fraction of Al increases. As the fraction of Al further increases up to 0.8, the hexagonal AlN phase precipitates. The hardness of these coating are around 30 GPa higher than that prepared by other method.