Preparation of Nano Structured SiOC Thin Film for Low k Application

Abstract:

In our study, the dielectric properties of SiOC low k thin film derived from polyphenylcarbosilane were investigated as a potential interlayer dielectrics for Cu interconnect technology. A SiOC low k thin film was fabricated onto a n-type silicon wafer by dip coating using 30wt % polyphenylcarbosilane in cyclohexane. Curing of the film was performed in air at 300°C for 2h. The thickness of the film ranges from 1 μm to 1.7 μm. The dielectric constant was determined from the capacitance data obtained from metal/polyphenylcarbosilane/conductive Si MIM capacitors and shows a dielectric constant as low as 3.26 without porosity added. The SiOC low k thin film derived from polyphenylcarbosilane shows promising application as an interlayer dielectrics for Cu interconnect technology.

• Periodical: Journal of Nano Research (Volume 11)
• Pages: 85-88
• DOI: https://doi.org/10.4028/www.scientific.net/JNanoR.11.85
• Online since: May 2010
• Authors: Woo Teck Kwon, J.H. Lee, Soo Ryong Kim, H.T. Kim, Hyung Sun Kim, Y.H. Yu, Y. Kim
• Keywords: Low K, Nanostructure, Polyphenylcarbosilane, SiOC, Thin Film

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