SiOx Formation Process between YSZ and Si Substrate in YSZ/Si Thin Films by In-Situ TEM Analysis

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Edited by:

N. Murata, K. Shinozaki, S. Fujitsu and T. Kimura

Pages:

153-0

DOI:

10.4028/www.scientific.net/KEM.216.153

Citation:

T. Kiguchi et al., "SiOx Formation Process between YSZ and Si Substrate in YSZ/Si Thin Films by In-Situ TEM Analysis", Key Engineering Materials, Vol. 216, pp. 153-0, 2002

Online since:

September 2001

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$35.00

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