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HomeKey Engineering MaterialsKey Engineering Materials Vols. 228-229Site-Selective Deposition of TiO2 Thin Films Using...

Site-Selective Deposition of TiO₂ Thin Films Using Self-Assembled Monolayers and Their Dielectric Properties

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Asian Ceramic Science for Electronics II and Electroceramics in Japan V

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Periodical:

Key Engineering Materials (Volumes 228-229)

Pages:

125-130

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.228-229.125

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Online since:

September 2002

Authors:

Yoshitake Masuda, Dejun Wang, Tetsu Yonezawa, Kunihito Koumoto

Keywords:

Micropatterning, Molecular-Recognition, MOS, Selective Growth, Self-Assembled Monolayer (SAM), Thin Film, TiO₂

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© 2002 Trans Tech Publications Ltd. All Rights Reserved

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