Interfacial Reaction-Controlled Deposition and Micropatterning of Oxide Thin Films for Gate Dielectrics

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Periodical:

Edited by:

Keizo Uematsu and Harumi Yokokawa

Pages:

139-150

DOI:

10.4028/www.scientific.net/KEM.253.139

Citation:

K. Koumoto et al., "Interfacial Reaction-Controlled Deposition and Micropatterning of Oxide Thin Films for Gate Dielectrics", Key Engineering Materials, Vol. 253, pp. 139-150, 2003

Online since:

November 2003

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