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HomeKey Engineering MaterialsKey Engineering Materials Vol. 253Interfacial Reaction-Controlled Deposition and...

Interfacial Reaction-Controlled Deposition and Micropatterning of Oxide Thin Films for Gate Dielectrics

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Ceramic Interfaces: Properties and Applications V

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Periodical:

Key Engineering Materials (Volume 253)

Pages:

139-150

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.253.139

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Online since:

November 2003

Authors:

Kunihito Koumoto, Y. Masuda, D.J. Wang

Keywords:

Biomimetic, Gate Dielectric, Micropatterning, Self-Assembled Monolayer (SAM), Thin Film, TiO₂

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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