Preparation and Characterization of CuxO/Cu Thin Films by Reactive d.c. Magnetron Sputtering

S.A. Yeşilçubuk; S. Alkoy; O. Addemir; K. Şeşen; A.Y. Oral

doi:10.4028/www.scientific.net/KEM.264-268.569

Paper Titles

SiO₂-ZrO₂ Sol-Gel Nanostructured Thin Films with Optical Properties
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Solid Particle Erosion of Thermal Sprayed Ceramic, Metallic and Carbide Coatings
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Surface Modification of 8620 Steel by Pulse Plasma Technique After a Prior Carburisation Process
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Kinetics of Boride Layers Formed on the Surface of AISI 4140 Steel
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Preparation and Characterization of Cu_xO/Cu Thin Films by Reactive d.c. Magnetron Sputtering
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The Sol-Gel-Like Preparation of Cu_0.95Me_0.05O_x Thin Films and the Study of their Microstructures and Optical Properties
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Thermo-Reactive Diffusion Vanadium Nitride Coatings on AISI 1020 Steel
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Tribological Performance of Ceramic Coatings Deposited on Polymer Substrates
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Wear and Friction Properties of Multilayer Hard Coatings by HTCVD Method
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HomeKey Engineering MaterialsKey Engineering Materials Vols. 264-268Preparation and Characterization of CuxO/Cu Thin...

Preparation and Characterization of Cu_xO/Cu Thin Films by Reactive d.c. Magnetron Sputtering

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Periodical:

Key Engineering Materials (Volumes 264-268)

Pages:

569-572

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.264-268.569

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Online since:

May 2004

Authors:

S.A. Yeşilçubuk, S. Alkoy, O. Addemir, K. Şeşen, A.Y. Oral

Keywords:

Copper Oxide, Oxide Semiconductor, Sputtering, Thin Film

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