Nitrogen Plasma Source Ion Implantation (PSII) for Improvement of Blood-Compatibility of Silicon

Ping Yang; Guo Jiang Wan; X. Xie; Y.X. Leng; Hong Fang Zhou; Paul K. Chu; Nan Huang

doi:10.4028/www.scientific.net/KEM.288-289.335

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Nitrogen Plasma Source Ion Implantation (PSII) for Improvement of Blood-Compatibility of Silicon
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Hemocompatibility of PET (Polyethylene Terephthalate) Films Grafted PEG (Polyethylene Glycol) by Plasma Surface Modification
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Nitrogen Plasma Source Ion Implantation (PSII) for Improvement of Blood-Compatibility of Silicon

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Key Engineering Materials (Volumes 288-289)

Pages:

335-338

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.288-289.335

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Online since:

June 2005

Authors:

Ping Yang, Guo Jiang Wan, X. Xie, Y.X. Leng, Hong Fang Zhou, Paul K. Chu, Nan Huang

Keywords:

Bloodcompatibility, Nitrogen-Implanted Silicon, Plasma Source Ion Implantation PSII

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