Effect of Deposition Conditions on TiO2 Thin Film on Silica Glass Fibers by Liquid Phase Deposition

Shun Li; Jia Chen Liu; Chao Liang Cui; Li Bin Liu

doi:10.4028/www.scientific.net/KEM.336-338.1921

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HomeKey Engineering MaterialsKey Engineering Materials Vols. 336-338Effect of Deposition Conditions on TiO2 Thin Film...

Effect of Deposition Conditions on TiO₂ Thin Film on Silica Glass Fibers by Liquid Phase Deposition

Abstract:

Crystalline TiO2 thin films coated on silica glass fibers and nano-powders were prepared by adding H3BO3 into an (NH4)2TiF6 solution supersaturated with anatase nano-crystalline TiO2 at 40°C. The effect of the deposition conditions on the surface morphology, section morphology, growth patterns, thicknesses of the deposited TiO2 thin films were investigated. Growth rate and particle size of the thin films were controlled by the deposition conditions. As a result, a well-combined and durable TiO2 thin films on silica glass fibers surface obtained under definite optimizing experimental conditions and parameters.

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Periodical:

Key Engineering Materials (Volumes 336-338)

Pages:

1921-1923

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.336-338.1921

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Online since:

April 2007

Authors:

Shun Li, Jia Chen Liu, Chao Liang Cui, Li Bin Liu

Keywords:

Liquid Phase Deposition (LPD), Silica Glass Fiber, Thin Film, Titania (TiO₂)

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References

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