Fabrication of PbTiO3 Nanocrystals on Atomically Flat Sapphire Substrates by Sputtering
In order to perform the growth position control, PbTiO3 (x=0) (PTO) nanocrystals were deposited on atomically flat and non-atomically flat -Al2O3 substrates by RF magnetron sputtering. The atomically flat substrates with atomic steps and terrace are expected to induce the lateral growth along a terrace between the surface steps. In the case of the atomically flat, the nanocrystals got lined up along the atomic steps, and uniform nanocrystals were obtained on surface in same pitch.
Tadashi Takenaka, Hajime Haneda, Kazumi Kato, Masasuke Takata and Kazuo Shinozaki
T. Nishida et al., "Fabrication of PbTiO3 Nanocrystals on Atomically Flat Sapphire Substrates by Sputtering", Key Engineering Materials, Vols. 421-422, pp. 502-505, 2010