Research on Quantum State in Fabricating Poly-Si Films

Abstract:

Article Preview

Amorphous silicon films prepared by PECVD on glass substrate have been crystallized by rapid thermal annealing (RTA). By means of micro-Raman scattering and scanning electronic microscope (SEM), the quantum states in these processions are found and discussed.

Info:

Periodical:

Key Engineering Materials (Volumes 428-429)

Edited by:

Yuan Ming Huang

Pages:

540-543

DOI:

10.4028/www.scientific.net/KEM.428-429.540

Citation:

R. M. Jin et al., "Research on Quantum State in Fabricating Poly-Si Films", Key Engineering Materials, Vols. 428-429, pp. 540-543, 2010

Online since:

January 2010

Export:

Price:

$38.00

[1] R. Singh, M. Fakhruddin and K. F . Poole: Applied Surface Science Vol. 168 (2000) , p.198.

[2] R. Jin, J. Lu, T. Feng et al. Applied Surface Science Vol. 252 (2006), p.8258.

[3] R. Jin, J. Lu, R. Li, et al. Semiconductor Photonics and Technology Vol. 11 (2005), p.37.

[4] M. Bonnel, N. Duhumel, M. Guendouz, et al. Jpn. J. Appl. Phys. Vol. 30 (1991), p. L1924.

[5] R. Kingi, Y. Wang, S. J. Fonash, et al. Mater. Res. Soc. Symp. Proc Vol. 424 (1996), p.237.

In order to see related information, you need to Login.