Effect of Substrate on Growth Mechanism of Flower Structured InN Fabricated by APHCVD

Abstract:

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InN belongs to the III-group nitride materials and is known to have a low decomposition temperature which causes intractable grain growth compared to the other nitrides, GaN, AlN, etc. We prepared InNs with a flower-like shape as well as film structure by Atmospheric Pressure Halide CVD process, in which InN is synthesized by CVD under atmospheric pressure. In the present study, growth mechanisms of the flower structured InN prepared on Si(100) and a-plane sapphire substrates is reported.

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Periodical:

Edited by:

Shinobu Fujihara and Tadashi Takenaka

Pages:

209-212

DOI:

10.4028/www.scientific.net/KEM.445.209

Citation:

N. Sakamoto et al., "Effect of Substrate on Growth Mechanism of Flower Structured InN Fabricated by APHCVD", Key Engineering Materials, Vol. 445, pp. 209-212, 2010

Online since:

July 2010

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$35.00

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