Comparison of Picosecond and Femtosecond Laser Ablation for Surface Engraving of Metals and Semiconductors

Abstract:

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Pico and femtosecond lasers present a growing interest for industrials applications such as surface structuring [1] or thin film selective ablation [2]. Indeed, they combine the unique capacity to process any type of material (dielectrics, semiconductors, metals) with an outstanding precision and a reduced affected zone. We report on results about surface engraving of metals (Al, Cu, Mo, Ni), semiconductor (Si) and polymer (PC) using a picosecond thin disk Yb:YAG-amplifier. The pulse duration of this source can be changed using two different configurations: direct amplification of a 34ps-oscillator on one hand, and 1ps-chirped pulse amplification (CPA) scheme on the other hand. The results obtained with this thin disk laser are compared to ones achieved with two commercial femtosecond lasers respectively based on Yb-doped crystals and fibers, and operating at similar output power levels (up to 15Watt).

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Periodical:

Edited by:

Michael N. Morgan, Andrew Shaw and Otar Mgaloblishvili

Pages:

61-66

DOI:

10.4028/www.scientific.net/KEM.496.61

Citation:

J. Lopez et al., "Comparison of Picosecond and Femtosecond Laser Ablation for Surface Engraving of Metals and Semiconductors", Key Engineering Materials, Vol. 496, pp. 61-66, 2012

Online since:

December 2011

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$35.00

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