Band Gap and Conductivity Measurement of TiO2 Thin Films Deposited by Sol-Gel Spin Coating Method

Abstract:

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Thin films of TiO2 have been deposited on to cleaned glass substrate by sol gel spin coating method. The XRD analyses confirm different crystalline phases of TiO2 thin films. The grain size calculated by the help of Scherer’s formula and found to be 23nm, 37nm and 54 nm respectively for TiO2(004), TiO2(200) and TiO2(211) orientations. The band gap was calculated 3.6 eV by UV-spectrophotometer. The refractive index of the TiO2 film was measured by Ellipsometry and found to be 2.33. Conductivity was measured using Current voltage (I-V) characteristics. To determine composition and thermal stability, thermo gravimetric Analyzer (TGA) and Differential Scanning Calorimeter (DSC) analysis was made on samples.

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Periodical:

Edited by:

David Wang

Pages:

273-277

DOI:

10.4028/www.scientific.net/KEM.500.273

Citation:

D. Rathee et al., "Band Gap and Conductivity Measurement of TiO2 Thin Films Deposited by Sol-Gel Spin Coating Method", Key Engineering Materials, Vol. 500, pp. 273-277, 2012

Online since:

January 2012

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$35.00

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