Band Gap and Conductivity Measurement of TiO₂ Thin Films Deposited by Sol-Gel Spin Coating Method

Abstract:

Thin films of TiO₂ have been deposited on to cleaned glass substrate by sol gel spin coating method. The XRD analyses confirm different crystalline phases of TiO₂ thin films. The grain size calculated by the help of Scherer’s formula and found to be 23nm, 37nm and 54 nm respectively for TiO₂(004), TiO₂(200) and TiO₂(211) orientations. The band gap was calculated 3.6 eV by UV-spectrophotometer. The refractive index of the TiO₂ film was measured by Ellipsometry and found to be 2.33. Conductivity was measured using Current voltage (I-V) characteristics. To determine composition and thermal stability, thermo gravimetric Analyzer (TGA) and Differential Scanning Calorimeter (DSC) analysis was made on samples.

• Periodical: Key Engineering Materials (Volume 500)
• Pages: 273-277
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.500.273
• Online since: January 2012
• Authors: Davinder Rathee, Mukesh Kumar, Sandeep K. Arya, Mukesh Sharma
• Keywords: Bandgap, Conductivity, Thin Film, TiO₂, X-Ray Diffraction (XRD)

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