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The Improvement of Removal Function in Local Wet Etching by Using Eccentric Rotation System

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Abstract:

Numerical controlled local wet etching is a novel non-contact deterministic figuring method in ultra precision optics fabricating and functional material manufacturing fields, and the cross-sectional shape of the traditional removal spot is a simple cylinder, so the removal function has no adjustability. In order to create more practical and regular removal function, an eccentric rotation system is introduced to improve the LWE system. By controlling the eccentricity, it can achieve varied shapes removal function. When the rotary axis is controlled to a proper eccentricity, the removal function can be close to the Gaussian function. Moreover, the theoretical calculation and experimental validation are coincident and can give the research a steady foundation. The improvement not only can increase the adjustability of the removal function in LWE, but also can expand its applied field and provide reference for other ultra precision machining methods whose removal function does not have circular symmetry.

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Proceedings of Precision Engineering and Nanotechnology View Preview

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Periodical:

Key Engineering Materials (Volume 516)

Pages:

504-509

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.516.504

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Online since:

June 2012

Authors:

Xin Min Shen, Yi Fan Dai, Wen Qiang Peng, Mikinori Nagano, Kazuya Yamamura

Keywords:

Adjustability, Eccentric Rotation System, Local Wet Etching, Removal Function

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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References

[1] K. Yamamura, Development of numerically controlled local wet etching, Sci. Technol. Adv. Mater. (2007) 158-161.

Google Scholar

[2] K. Yamamura, Fabrication of ultra-precision optics by numerically controlled local wet etching, Ann. CIRP 56 (2007) 541-544.

DOI: 10.1016/j.cirp.2007.05.129

Google Scholar

[3] K. Yamamura, M. Nagano, H. Takai, N. Zettsu, D. Yamazaki, R. Maruyama, K. Soyama, S. Shimad, Figuring of plano-elliptical neutron focusing mirror by local wet etching, Opt. Express 17 (2009) 6414-6420.

DOI: 10.1364/oe.17.006414

Google Scholar

[4] K. Yamamura, K. Ueda, M. Nagano, N. Zettsu, S. Maeo, S. Shimada, T. Utaka, K. Taniguchi, Fabrication of damage-free Johansson-type doubly curved crystal spectrometer substrate by numerically controlled local wet etching, Nucl. Instrum. Methods Phys. Res., Sect. A 616(2010).

DOI: 10.1016/j.nima.2009.12.006

Google Scholar

[5] K. Yamamura, M. Nagano, N. Zettsu, D. Yamazaki, R. Maruyama, K. Soyama, High-reflectivity(m=4) elliptical neutron focusing super mirror fabricated by numerically controlled local wet etching with ion beam sputter deposition, Nucl. Instrum. Methods Phys. Res., Sect. A 616 (2010).

DOI: 10.1016/j.nima.2009.11.070

Google Scholar

[6] J. Shen, S. Liu, K. Yi, H. He, J, Shao, Z. Fan Subsurface damage in optical substrates, optik, 2005, 116(6), 288-294.

DOI: 10.1016/j.ijleo.2005.02.002

Google Scholar

[7] J.H. Campbell, R. Hawley-Fedder, C.J. Stolz, J.A. Menapace, M.R. Borden, P. Whitman, J. Yu, M. Runkel, M. Filey, M. Feit, R. Hackel, NIF optical materials and fabrication technologies: an overview, Proc. SPIE, 5341 (2004) 84-101.

DOI: 10.1117/12.538471

Google Scholar