Sub-Nanometer Line Width and Line Profile Measurement Using STEM Images with Metal Coating

Haruki Okito; Satoru Takahashi; Kiyoshi Takamasu

doi:10.4028/www.scientific.net/KEM.523-524.957

Paper Titles

Automatic Recognition of a Piping System from Laser Scanned Points by Eigenvalue Analysis
p.932

Cr-N Strain-Gauge-Type Precision Displacement Sensor for Measuring Positions of Micro Stage
p.939

Improvement of an Air-Bearing Displacement Sensor with Nanometric Resolution
p.945

Effect of Discharge Condition on Cavitations Behavior by Single Pulse Discharge
p.951

Sub-Nanometer Line Width and Line Profile Measurement Using STEM Images with Metal Coating
p.957

Characterization of TMR Head Durability against Lapping Based on Magnetic Performance
p.961

Cutting Performance of Oxygen-Including Compounds in MQL Machining of Aluminum
p.967

Development of Electric Rust Preventive Machining Method – Optimization of Water Recycle System
p.973

Development of Electric Rust Preventive Machining Method - Improvement of Electric Rust Preventive Chip Sedimentation System
p.979

HomeKey Engineering MaterialsKey Engineering Materials Vols. 523-524Sub-Nanometer Line Width and Line Profile...

Sub-Nanometer Line Width and Line Profile Measurement Using STEM Images with Metal Coating

Abstract:

The novel method of sub-nanometer uncertainty for the line width and line profile measurement using STEM (Scanning Transmission Electron Microscope) images is proposed to calibrate CD-SEM line width measurement. In accordance with the proposed method, the traceability and reference metrology of line width measurements are established using Si lattice structures. The interface of SiO2-Air is defined using image intensity of STEM image after metal coating. The edge positions of the Si line from top to bottom are detected. Then, the pixel size of the images is evaluated using 2D Fourier analysis for Si lattice structures. Using the proposed method, the line profile and line width of 50 nm are measured with expanded uncertainty less than 0.3 nm.

You might also be interested in these eBooks

Emerging Technology in Precision Engineering XIV

View Preview

Info:

Periodical:

Key Engineering Materials (Volumes 523-524)

Pages:

957-960

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.523-524.957

Citation:

Cite this paper

Online since:

November 2012

Authors:

Haruki Okito, Satoru Takahashi, Kiyoshi Takamasu

Keywords:

CD-SEM, Line Profiles, Line Width, Metal Coating, Si Lattice, STEM, Uncertainty

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] Y. Nakayama, S. Gonda, I. Misumi, T. Kurosawa, J. Kitta, H. Mine, K. Sasada, S. Yoneda, T. Mizuno, Novel CD-SEM calibration reference patterned by EB cell projection lithography, Proc. SPIE 5752 (2005) 591-602.

DOI: 10.1117/12.597165

Google Scholar

[2] A. Yamaguchi, H. Fukuda, H. Kawada, T. Iizumi, Impact of long-edge roughness (LER) on accuracy in critical dimension measurement and new guideline for CD metrology, Jpn. J. Appl. Phys. 44 (2005) 5575-5580.

DOI: 10.1143/jjap.44.5575

Google Scholar

[3] J.S. Villarrubia, A.E. Vladar, M.T. Postek, A simulation study of repeatability and bias in the CD-SEM, Proc. SPIE 5038 (2003) 138-149.

DOI: 10.1117/12.485012

Google Scholar

[4] Y. Nakayama, H. Kawada, S. Yoneda, T. Mizuno, Novel CD-SEM calibration reference consisting of 100-nm pitch grating and positional identification mark, Proc. SPIE 6518 (2007), 65183J.

DOI: 10.1117/12.710772

Google Scholar

[5] H. Abe, A. Hamaguchi, Y. Yamazaki, Evaluation of CD-SEM measurement uncertainty using secondary electron simulation with charging effect, Proc. SPIE 6518 (2007) 65180L.

DOI: 10.1117/12.712191

Google Scholar

[6] R. Dixson, N.G. Orji, Comparison and uncertainties of standards for critical dimension atomic force microscope tip width calibration, Proc. SPIE 6518 (2007) 651816.

DOI: 10.1117/12.714032

Google Scholar

[7] FIB (FB-2100), http: /www. hitachi-hitec. com/global/em/fib/fib_index. html.

Google Scholar

[8] STEM (HD-2700), http: /www. hitachi-hitec. com/global/em/tem/tem_index. html.

Google Scholar

[9] K. Takamasu, K. Kuwabara, S. Takahashi, T. Mizuno, H. Kawada, Sub-nanometer Calibration of CD-SEM Line Width by Using STEM, Proc. SPIE 7638 (2010) 55.

DOI: 10.1117/12.846436

Google Scholar

[10] K. Takamasu, H. Okito, S. Takahashi, M. Konno, O. Inoue, H. Kawada, Sub-nanometer line width and line profile measurement, Proc. SPIE 797108 (2011) 1-8.

DOI: 10.1117/12.879036

Google Scholar