Advanced Process for SiO2 Film Deposition in Aqueous Solution

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Periodical:

Key Engineering Materials (Volumes 53-55)

Edited by:

P.J. Darragh and R.J. Stead

Pages:

474-479

DOI:

10.4028/www.scientific.net/KEM.53-55.474

Citation:

Y. Sakai et al., "Advanced Process for SiO2 Film Deposition in Aqueous Solution", Key Engineering Materials, Vols. 53-55, pp. 474-479, 1991

Online since:

January 1991

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Price:

$35.00

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