Adhesion Performance and Wear Resistance of Multilayered TiN Coating Deposited by Hollow Cathode Discharge Method
Multilayered TiN coating was successfully prepared by hollow cathode discharge method. By introduction of the multilayered microstructure, the columnar epitaxial growth of TiN grains was obviously suppressed. The hardness, adhesion performance and wear resistance of the multilayered TiN coating were compared with those of the ordinary TiN coating. The wear resistance of the multilayered TiN coating is much better than that of the ordinary TiN coating. It is due to the multilayered microstructure of the coating that pileups the dislocations and also inhibits the bulk-flaking behavior for the multilayered TiN coating. The morphology analysis of cross section shows that the wear mechanism of the multilayered TiN coating is the micro-area detachment. Moreover, the adhesion of the TiN coating to the substrate is greatly enhanced by the microstructure optimization of the coating.
Chunliang Zhang and Liangchi Zhang
Z. M. Yu et al., "Adhesion Performance and Wear Resistance of Multilayered TiN Coating Deposited by Hollow Cathode Discharge Method", Key Engineering Materials, Vols. 531-532, pp. 342-345, 2013