Structural and Optical Properties of Pulse Laser Deposited TiO₂ Thin Films

Abstract:

TiO2 thin films were prepared on quartz glasses by pulsed laser deposition (PLD) using a KrF laser excimer. The crystalline structure was characterized by X-ray diffraction, and the optical properties of the films were investigated using spectroscopic ellipsometry and UV-vis spectra respectively. The effects of the PLD conditions, including substrate temperature and O2 pressure on the crystalline structure and the optical properties of the films were investigated. The results indicated that there are a suitable substrate temperature and an O2 pressure which is favorable for the synthesis of anatase-type TiO2.

• Periodical: Key Engineering Materials (Volume 537)
• Pages: 224-228
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.537.224
• Online since: January 2013
• Authors: Yi Liu, Hong Mo Huang, Xiao Dong Lin
• Keywords: Optical Constant, Pulse Laser Deposition, Spectroscopic Ellipsometry, Titanium Dioxide (TiO₂)

References

[1] A. Maldotti, A. Molinari, R. Amadelli, Photocatalysis with organized systems for the oxo- functionalization of hydrocarbons by O2, Chem.Rev.102(2002)3811-3836.

DOI: 10.1021/cr010364p

[2] M. Grätzel, Photoelectrochemical cells, Nature 414(2001)338-344.

[3] Y. Furubayashi, T. Hitosugi, T. Hasegawa, A transparent metal: Nb-doped anatase TiO2, Appl. Phys. Lett. 86 (2005) 252101-252103.

DOI: 10.1063/1.2208448

[4] K. Hara, K. Miyamoto, Y. Abe, Electron transport in coumarin-dye-sensitized nanocrystalline TiO2 electrodes, J. Phys. Chem. B. 109 (2005) 23776-23778.

DOI: 10.1021/jp055572q

[5] D. Yoo, I. Kim, S. Kim, Effects of annealing temperature and method on structural and optical properties of TiO2 films prepared by RF magnetron sputtering at room temperature, Appl. Surf. Sci. 253 (2007) 3888-3892.

DOI: 10.1016/j.apsusc.2006.08.019

[6] H. Kikuchi, M. Kitano, M. Takeuchi, Extending the photoresponse of TiO2 to the visible light region: photoelectrochemical behavior of TiO2 thin films prepared by the radio frequency magnetron sputtering deposition method, J. Phys. Chem. B. 110 (11) (2006) 5537-5541

DOI: 10.1021/jp058262g.s001

[7] A.L. Linsebigler, G.Q. Lu, J. T. Yates, CO photooxidation on TiO2(110), J. Phys. Chem. 100(16) (1996) 6631-6636.

DOI: 10.1021/jp952018f

[8] C. Anderson, A.J. Bard, Improved photocatalytic activity and characterization of mixed TiO2/SiO2 and TiO2/Al2O3 materials, J. Phys. Chem. B. 101(14) (1997) 2611-2616.

[9] J. H. Kim, S. Lee, H.S. Im, The effect of target density and its morphology on TiO2 thin films grown on Si(100) by PLD, Appl. Surf. Sci. 151 (1999) 6-16.

DOI: 10.1016/s0169-4332(99)00269-x

[10] D. Luca, D. Macovei, C.M. Teodorescu, Characterization of titania thin films prepared by reactive pulsed-laser ablation, Surf. Sci. 600 (2006) 4342-4346.

DOI: 10.1016/j.susc.2006.01.162

[11] M. Gioti, D. Papadimitriou, S. Logothetidis, Diamond Relat. Mater. 9(2000) 741-744.

[12] M. Schubert, Generalized ellipsometry and complex optical systems, Thin Solid Films. 313-314 (1998) 323-332

DOI: 10.1016/s0040-6090(97)00841-9

[13] D. Wicaksana, A. Kobayashi, A. Kinbara, Process effects on structural properties of TiO2 thin films by reactive sputtering J. Vac. Sci. Technol. A. 10 (1992) 1479-1482.

DOI: 10.1116/1.578269

[14] G.E. Jellison, F.A. Modine, Parameterization of the optical functions of amorphous materials in the interband region, Appl. Phys. Lett. 69 (1996) 371-373.

DOI: 10.1063/1.118064

[15] G. E. Jellison, V. I. Merkulov, A. A. Puretzky, Characterization of thin-film amorphous semi-conductors using spectroscopic ellipsometry, Thin Solid Films. 377-378(2000) 68-73.

DOI: 10.1016/s0040-6090(00)01384-5

[16] J. A. Wollam Company, The user manual of variable angle spectroscopic ellipsometry, J. A. Wollam Company, Lincoln, Neb., 2000, pp.2-50

[17] Y. R. Park, K. J. Kim, Structural and optical properties of rutile and anatase TiO2 thin films: Effects of Co doping, Thin Solid Films. 484 (2005) 34-38.

DOI: 10.1016/j.tsf.2005.01.039

[18] M.C. Kao, H.Z. Chen, S.L. Young, The effects of the thickness of TiO2 films on the performance of dye-sensitized solar cells, Thin Solid Films. 517 (2009)5096-5099

DOI: 10.1016/j.tsf.2009.03.102