Copper Nanowires Preparation and Field Electron Emission Properties

Abstract:

Copper (Cu) nanowires films are deposited on the molybdenum film-coated Al₂O₃ ceramic substrates by using the electron beam vapor deposition technique. The films were characterized by optical microscopy, scanning electron microscope , x-ray diffraction spectrum and energy dispersive spectrum. The surface morphology show that the Cu nanowires have excellent length-to-diameter ratio of 300, and each Cu nanowires diameter is uniform. The field electron emission measurements of Cu nanowires films were also carried out showing the turn on field as low as 2.5 V/μm and the average current density of 0.10 mA/cm² at electric field of 10.8 V/μm were obtained from a broad uniform emission screen over 3.0 cm².

• Periodical: Key Engineering Materials (Volume 537)
• Pages: 298-301
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.537.298
• Online since: January 2013
• Authors: Li Jun Wang, Can Yang, Zi Wang, Xiao Fei Liu, Xiao Ping Wang
• Keywords: Copper Nanowires Films, Electron Beam Vapor Deposition, Field Electron Emission

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