Chemical Composition Analysis of TiAlBN Nanocomposite Coating Deposited via RF Magnetron Sputtering

Abstract:

TiAlBN nanocomposite coating have been successfully deposited on AISI 316 substrate via RF magnetron sputtering by varying nitrogen-to-total flow ratio (R_N) of 5, 15, 20, 25%, as well as varying substrate temperature of 100, 200, 300, and 400 oC; using single Ti-Al-BN hot-pressed target. Chemical compositions of the coatings were analysed using X-ray photoelectron spectroscopy (XPS). XPS results showed that the TiAlBN nanocomposite coating reaches a nitride saturated state at higher R_N (e.g 15, 20, and 25%) and boron concentration was found to be approximately 9 at.%. However, as the concentration of nitrogen decreases at lower R_N (5%), boron concentration was found to increase to 16.17 at. %_. This is due to the increase of TiB₂ phase in the coating. Variations of substrate temperatures were found to give no significant effect on the chemical composition of the deposited TiAlBN nanocomposite coating.

• Periodical: Key Engineering Materials (Volumes 594-595)
• Pages: 551-555
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.594-595.551
• Online since: December 2013
• Authors: Zulkifli Mohd Rosli, Zainab Mahamud, Wai Loon Kwan, Jariah Mohd Juoi, K.T. Lau
• Keywords: GAXRD, Nanocomposite, RF Magnetron Sputtering, TiAlBN, XPS

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