Structure and Epitaxial Behavior of Rutile TiO2 Thin Films Prepared by DC Magnetron Sputtering and Ex-Situ Annealing

Tomas Roch; Pavol Durina; Martin Truchly; Tomas Plecenik; Branislav Grancic; Marian Mikula; Ali Azhar Haidry; Maros Gregor; Leonid Satrapinskyy; Peter Kus; Andrej Plecenik

doi:10.4028/www.scientific.net/KEM.605.487

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 605Structure and Epitaxial Behavior of Rutile TiO2...

Structure and Epitaxial Behavior of Rutile TiO₂ Thin Films Prepared by DC Magnetron Sputtering and Ex-Situ Annealing

Abstract:

Titanium dioxide gas sensors are typically employing metastable anatase nanocrystalline phase. Operation at high temperature can thus negatively affect their long term stability. Employment of rutile phase with strong texture and larger grain size may ensure better reliability and longer lifetime. Therefore in this work we study the possibility to utilize stable rutile phase thin films prepared at relatively low temperature on c-cut sapphire substrates. Technological conditions have been chosen in order to obtain highly oriented titanium dioxide rutile thin films using reactive DC magnetron sputtering on unheated substrates. Subsequent ex-situ annealing in temperature range from 500°C to 800°C leads to increase of crystallite size and improvement of in-plane preferential orientation. Surface topography has been characterized by atomic force microscopy. Structure, texture and the strain evolution has been investigated using x-ray diffraction measurements. All investigated thin films showed epitaxial relationship with respect to the substrate: rutile-TiO₂(100)[00 || Al₂O₃(0001)[10. Sensitivity of such rutile films to hydrogen has been measured and compared with our previous results on anatase thin films.

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Periodical:

Key Engineering Materials (Volume 605)

Pages:

487-490

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.605.487

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Online since:

April 2014

Authors:

Tomas Roch*, Pavol Durina, Martin Truchly, Tomas Plecenik, Branislav Grancic, Marian Mikula, Ali Azhar Haidry, Maros Gregor, Leonid Satrapinskyy, Peter Kus, Andrej Plecenik

Keywords:

Atomic Force Microscopy (AFM), Magnetron Sputtering, Thin Film, Titanium Dioxide, X-Ray Diffraction (XRD)

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