Influence of Post-Deposition Annealing on Structure and Optical Characteristics of Niobium Oxide Thin Films

Abstract:

In this work, niobium oxide thin films were deposited on silicon wafer (100) and glass slide substrate by reactive magnetron sputtering. The niobium oxide films were further annealed and effect of post annealing on the crystallinity, microstructure and optical properties was studies. In order to identify the crystalline structure and microstructure, X-ray diffraction (XRD) and scanning electron microscope (SEM) measurement carried out. The optical property was determined by UV-Vis spectrophotometer. It has been observed that with increase in annealing temperature films become microcrystalline films. In particularly, the optical property of niobium oxide thin film also improves with annealing temperature.

• Periodical: Key Engineering Materials (Volumes 675-676)
• Pages: 245-248
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.675-676.245
• Online since: January 2016
• Authors: Wichan Lertlop, Narong Sangwaranatee, Mati Horprathum, Jakrapong Kaewkhao
• Keywords: Annealed, Nb₂O₅ Thin Film, Sputtering

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