On Atomic Surface Roughness Evaluation

Article Preview

Abstract:

The atomic surface finish or roughness can be defined as the roughness limit of a surface. Its value has been demonstrated both in theory and in experiments to be non-zero [1, 2]. This parameter is very important in assessing the quality of high performance nanosurfaces, and so its understanding is very crucial. In this study, multi-pass nanometric atomistic simulations were carried out, with a diamond tool on a copper workpiece to create a nanosurface and the results provide the platform from which the atomic surface roughness was evaluated. The estimated surface roughness (Sa) was in the order of 0.3nm.

You might also be interested in these eBooks

Info:

Periodical:

Pages:

200-203

Citation:

Online since:

February 2016

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2016 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] J. Yu, Y. Namba, Atomic surface roughness, Applied Physics Letters 73 (1998) 3607-3609.

DOI: 10.1063/1.122839

Google Scholar

[2] Y. Namba, J. Yu, J.M. Bennett and K., Yamashita, Modelling and measurements of atomic surface roughness, Applied Optics, 39 (16) (2000) 2705-2718.

DOI: 10.1364/ao.39.002705

Google Scholar

[3] Y.V. Shusterman , N.L. Yakovlev and L.J. Schowalter, Ultra-thin epitaxial Al and Cu films on CaF2/Si(111), Applied Surface Science, 175 (2001) 27-32.

DOI: 10.1016/s0169-4332(01)00033-2

Google Scholar

[4] Z. –H. Hong, S. -F. Hwang and T. -H. Fang, Atomic-level stress calculation and surface roughness of film deposition process using molecular dynamics simulation, Computational Materials Science 48 (3) (2010) 520-528.

DOI: 10.1016/j.commatsci.2010.02.018

Google Scholar

[5] S. -F. Hwang, Y. -H. Li and Z. -H. Hong, Molecular dynamic simulation for Cu cluster deposition on Si substrate, Computational Materials Science 56 (2012) 85-94.

DOI: 10.1016/j.commatsci.2012.01.010

Google Scholar

[6] I. Misumi, K. Naoi, K. Sugawara and S. Gonda, Profile surface roughness measurement using metrological atomic force microscope and uncertainty evaluation, Measurement 73 (2015) 295-303.

DOI: 10.1016/j.measurement.2015.05.026

Google Scholar

[7] M. Cai, X. Li and M. Rahman, Molecular dynamics modelling and simulation of nanoscale ductile cutting of silicon, International Journal of Computer Applications in Technology 28 (1) (2007) 2-8.

DOI: 10.1504/ijcat.2007.012325

Google Scholar

[8] Y. Guo, Y, Liang, M. Chen, Q. Bai and L. Lu, Molecular dynamics simulations of thermal effects in nanometric cutting process, Science China Technological Sciences 53 (3) (2010) 870-874.

DOI: 10.1007/s11431-009-0243-9

Google Scholar

[9] W.C.D. Cheong, L. Zhang and H. Tanaka, Some essentials of simulating nano-surface processes using the molecular dynamics method, Key Engineering Materials 196 (2001) 31-42.

DOI: 10.4028/www.scientific.net/kem.196.31

Google Scholar

[10] Z. -C. Lin, Z. -D. Chen and J. -C. Huang, Establishment of a cutting force model and study of the stress-strain distribution in nano-scale copper material orthogonal cutting, International Journal of Advanced Manufacturing Technology 33 (5-6) (2007).

DOI: 10.1007/s00170-006-0480-z

Google Scholar

[11] S.J. Plimpton, Fast parallel algorithms for short-range molecular dynamics, Journal Comp. Phys. 117 (1995) 1- 19 and www. lammps. sandia. gov.

Google Scholar

[12] Visual Molecular Dynamics (VMD), http: /www. ks. uiuc. edu/Research/vmd.

Google Scholar

[13] A.O. Oluwajobi, PhD Thesis, Nanomachining technology development, University of Huddersfield (2012).

Google Scholar

[14] A.O. Oluwajobi and X. Chen, The effect of depth of cut on the molecular dynamics (MD) simulation of multi-pass nanometric machining, Proceedings of the 17th International Conference on Automation & Computing, (2011) 40-45.

DOI: 10.4028/www.scientific.net/kem.496.241

Google Scholar

[15] A. Stukowski, Visualization and analysis of atomic simulation data with OVITO – The open visualization tool, Modelling Simul. Mat. Scien. Eng. 18 (2010) 015012-015018.

DOI: 10.1088/0965-0393/18/1/015012

Google Scholar

[16] L. Blunt and X. Jiang, Advanced Techniques for Assessment Surface Topography: Development of a Basis for 3D Surface Texture Standards Surfstand, London, Kogan Page Science, (2003).

Google Scholar