Nano-Scale Particle Formation by Dynamic Mixing Method in Physical Vapor Deposition

Abstract:

Nano size (2 - 10 nm) metal particles were formed and accumulated on powder substrate by conventional physical vapor deposition (PVD) process, in which the powder were a non-volatile in vacuum, such as Al₂O₃ powder. The neutral nuclei which were formed on the substrates from vaporized or sputtered metal atoms at an initial thin film growth were not grown up to coalescence and island stage with arrival atoms and ad-atom migration in the continuous deposition process, when the powder in vessel were continuously stirred during the deposition. Nano sized particles on the polymer chips (diameter: 1-2mm) easily dispersed into the polymer matrix by heating the chips, and on non-soluble powder, g-Al₂O₃, were stuck on the supporters stably in air. The nanoparticles on sucrose directly formed colloid with water solvents without dispersive agents. Most of the nano sized particles appear their own characteristic colors due to plasmon effect. Concentration and size of the nanoparticles are controlled by physical parameters in the PVD and the stirring speed of the powder. Surface phenomena on the substrate have been discussed with TEM, SEM, EDX, UV spectroscopy, etc. comparing with the conventional thin film growth.

• Periodical: Key Engineering Materials (Volume 708)
• Pages: 14-19
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.708.14
• Online since: September 2016
• Authors: Seok Keun Koh*, Jung Hwan Lee, Charles Lee, Katherine Koh
• Keywords: Growth Mode, Nanoparticle, Nucleation, PVD

References

[1] T. Rajh, O. I. Micic, A. J. Nozik, J. Phys. Chem. 1996, 97, 11999.

[2] T. Shima, J. Tominaga, J. Vac. Technol. A 2003, 21(3), 634-637.

[3] R. Miller, G. McLendon, B. A. Nozik, W. Schmickler, F. Willig, Surface Electron Transfer Processes, VCH, New York, USA (1995).

[4] D. W. Bahnemann, C. Kormannm, M. R. Hoffmann, J. Phys. Chem. 1987, 91, 3789.

[5] A. Meier, D. C. Selmarten, K. Siemoneit, B. J Smith. & B. A. Nozik, J. Phys. Chem. B. 1999, 103, 2122.

[6] B. Kraeutler, A. J. Bard, J. Am. Chem. Soc. 1978, 100, 5985.

[7] A. Fujishima, K. Honda, Nature 1972, 238, 37.

[8] O. Micic, I. Y. Zhang, K. R. Cromack, A. Trifunae, D. M. Thurauer, J. Phys. Chem. 1993, 97, 13284.

[9] M. R. V. Sahyun, N. Serpone, Langmuir 1997, 13, 5082.

[10] T. A. Fulton, G. J. Dolan, Phys. Rev. Lett. 1987, 59, 109.

[11] Y. Cui, C. M. Lieber, Science 2001, 291, 851.

[12] G. Schmidt, in: K.J. Klabunde (Ed. ), Nanoscale Materials in Chemistry. John Wiley & Sons, New York, USA (2001).

[13] O. I. Micic, H. M. Cheong, H. Fu, A. Zunger, J. R. Sprague, J. Phys. Chem. B 1997, 101, 4904.

[14] Y. Lu, S.C. Chen, Advanced Drug Delivery Reviews 2004, 56, 1621.

[15] C. P. Wong, R. S. Bollampally, J. Appl. Polym. Sci. 1999, 74, 3396.

[16] S.C. Tjong, H. Chen, Materials Science and Engineering R 2004, 45, 1.

[17] S. K. Koh, C. Lee, J. Lee, B. Kang, H. Kaji, M. Hayashi, W. Cho, Advanced Materials Research 2015 1119, 3.

[18] C.G. Granqvist, O. Hunderi, Phys. Rev. B 1977, 16, 3513.

[19] B.G. Ershov, A. Henglein, J. Phys. Chem. 1993, 97, 3434.