Nanostructure and Microstructure Evolution of D.C. Reactive Magnetron Sputtered CrN Thin Films

Adisorn Buranawong; Nirun Witit-Anun

doi:10.4028/www.scientific.net/KEM.718.57

Paper Titles

A Study on Coconut Shell Powder Filled in Epoxy Resin: A Remedy for Electrical Tree Growth Inhibition
p.36

A Study on Modification Properties of Silicone Rubber Using Organic Filler from Golden Apple Snail Shell
p.40

Concentration and Temperature Dependences of Effective Ethanol Vapor Permeance of Plastic Films Utilized in Controlled Release-Based Active Packaging for Horticultural Products
p.45

Synthesis of TiO₂ Nanotubes and the Effects of Deionized Water on their Surface Morphology and Microstructure
p.51

Nanostructure and Microstructure Evolution of D.C. Reactive Magnetron Sputtered CrN Thin Films
p.57

Mechanical and Chemical Stabilities of Barium Alginate Gel: Influence of Chemical Concentrations
p.62

Synthesis, Characterization and Performance Validation of Hybrid Cation Exchanger Containing Hydrated Ferric Oxide Nanoparticles (HCIX-Fe) for Lead Removal from Battery Manufacturing Wastewater
p.67

Trace Lead Removal in Drinking Water Using High Capacity Polymeric Supported Hydrated Iron Oxide Nanoparticles
p.72

Rice Hull Micro and Nanosilica: Synthesis and Characterization
p.77

HomeKey Engineering MaterialsKey Engineering Materials Vol. 718Nanostructure and Microstructure Evolution of D.C....

Nanostructure and Microstructure Evolution of D.C. Reactive Magnetron Sputtered CrN Thin Films

Abstract:

The CrN thin films were deposited on silicon (100) substrate using reactive magnetron sputtering technique. The films were characterized by XRD, FE-SEM, EDS and nanoindentation techniques to examine the effect of deposition time on crystal structure, compositions, microstructure and hardness. The crystal structure, microstructure, element composition and hardness. The higher crystallinity through longer deposition time were investigated. The grain aggregration with columnar structure were obtained from FE-SEM. The Cr and N contents were not direct relationship with deposition time. The CrN coated sample performed hardness varied between 9 - 16 GPa.

You might also be interested in these eBooks

View Preview

Info:

Periodical:

Key Engineering Materials (Volume 718)

Pages:

57-61

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.718.57

Citation:

Cite this paper

Online since:

November 2016

Authors:

Adisorn Buranawong*, Nirun Witit-Anun

Keywords:

CrN, Nanostructured, Reactive Magnetron Sputtering, Thin Films

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

* - Corresponding Author

References

[1] A. Aubert, R. Gillet, A. Gaucher, J.P. Terrat, Hard chrome coatings deposited by physical vapour deposition, Thin Solid Films. 108 (1983) 165-172.

DOI: 10.1016/0040-6090(83)90501-1

Google Scholar

[2] P.H. Mayrhofer, H. Willmann, C. Mitterer, Oxidation kinetics of sputtered Cr–N hard coatings, Surf Coat Technol. 146 (2001) 147: 222-228.

DOI: 10.1016/s0257-8972(01)01471-2

Google Scholar

[3] J. Lin, W.D. Sproul, J.J. Moore, S. Lee, S. Myers, High rate deposition of thick CrN and Cr2N coatings using modulated pulse power (MPP) magnetron sputtering, Surf Coat Technol. 205 (2011) 3226-3234.

DOI: 10.1016/j.surfcoat.2010.11.039

Google Scholar

[4] F. Ferreira, J.C. Oliveira, A. Cavaleiro, CrN thin films deposited by HiPIMS in DOMS mode, Surf Coat Technol. 291 (2016) 365-375.

DOI: 10.1016/j.surfcoat.2016.02.064

Google Scholar

[5] A. Zeilinge, R. Daniel, T. Schöberl, M. Stefenelli, B. Sartory, J. Keckes, C. Mitterer, Resolving depth evolution of microstructure and hardness in sputtered CrN film, Thin Solid Films. 581 (2015) 75-79.

DOI: 10.1016/j.tsf.2014.10.106

Google Scholar

[6] L. Shan, Y. Wang, J. Li, X. Jiang, J. Chen, Improving tribological performance of CrN coatings in seawater by structure design, Tribol Int. 82 (2015) 78-88.

DOI: 10.1016/j.triboint.2014.10.006

Google Scholar

[7] B.D. Cullity, Elements of X-ray diffraction, 2e ed. California: Addison Wesley Publishing, (1977).

Google Scholar

[8] L. Chekour, C. Nouveau, A. Chala, C. Labidi, N. Rouag. M.A. Djouadi, Growth mechanism for chromium nitride films deposited by magnetron and triode sputtering methods, Surf Coat Technol. 200 (2005) 241-244.

DOI: 10.1016/j.surfcoat.2005.02.062

Google Scholar

[9] R. Wuhrer, W.A. Yeung, Comparative study of magnetron co-sputtered nanocrystalline titanium aluminium and chromium aluminium nitride coatings, Scripta Mater. 50 (2004) 144-146.

DOI: 10.1016/j.scriptamat.2004.03.007

Google Scholar

[10] D.L. Smith, Thin-Film Deposition: Principle And Practice. New York, (1995).

Google Scholar

[11] J.W. Lee, S.K. Tien, Y.C. Kuo, C.M. Chen, The mechanical properties evaluation of the CrN coatings deposited by the pulsed DC reactive magnetron sputtering, Surf Coat Technol. 200 (2006) 3330-3335.

DOI: 10.1016/j.surfcoat.2005.07.047

Google Scholar

[12] N.B. Dahotre., S. Nayak, Nanocoatings for engine application, Surf Coat Technol. 194 (2005) 58-67.

Google Scholar