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Tungsten Silicide Films Prepared by Excimer Laser Rapid Quenching

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Periodical:

Key Engineering Materials (Volumes 81-83)

Pages:

291-296

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.81-83.291

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Online since:

January 1993

Authors:

E. D'Anna, G. Leggieri, M. Luches, S. Luby, M. Martino, E. Majková, V. Bohác, V. Daniska

Keywords:

Laser Quenching, Tungsten Silicides, W/Si Interface

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© 1993 Trans Tech Publications Ltd. All Rights Reserved

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