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Tiling of Four Canonical Cells and Structural Models of Icosahedral Quasicrystals
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Mössbauer Study of Nanocrystals and Quasicrystals
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Structural Study of Amorphous W/Si Multilayers
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Tungsten Silicide Films Prepared by Excimer Laser Rapid Quenching
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Atomic Diffusion Dependent on Structure Relaxation in Compositionally Modulated Amorphous Transition Metal Films
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HomeKey Engineering MaterialsKey Engineering Materials Vols. 81-83Structural Study of Amorphous W/Si Multilayers

Structural Study of Amorphous W/Si Multilayers

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Amorphous Metallic Materials III

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Periodical:

Key Engineering Materials (Volumes 81-83)

Pages:

285-290

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.81-83.285

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Online since:

January 1993

Authors:

Matej Jergel, M. Brunel, E. Majková, S. Luby

Keywords:

Rapid Thermal Annealing (RTA), Structural Stability, W/Si Multilayers

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© 1993 Trans Tech Publications Ltd. All Rights Reserved

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