Using SiO2 Hard Mask for Fabrication of Micro Fresnel Focusing Lens for Ultrasonic Ejectors

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The fabrication of Fresnel focusing lenses operating at frequencies of 100 and 200 MHz was investigated in order to enhance the focusing efficiency of ultrasonic energy. The effects of process parameters on the four-level Fresnel lens profiles were discussed to find a most feasible fabrication procedure through these experiments. The quality of Fresnel lenses was improved when two-and three-mask processes using SiO2 film as the hard mask were employed. Besides, a better side-wall profile of Fresnel lens was obtained by using the three-mask process as compared to the two-mask one.

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73-78

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September 2020

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© 2020 Trans Tech Publications Ltd. All Rights Reserved

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