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HomeMaterials Science ForumMaterials Science Forum Vols. 155-156The Growth of Silicides in Ni-Si and Ni-SiC...

The Growth of Silicides in Ni-Si and Ni-SiC Diffusion Couples

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Reactive Phase Formation at Interfaces and Diffusion Processes

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Periodical:

Materials Science Forum (Volumes 155-156)

Pages:

561-564

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.155-156.561

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Online since:

May 1994

Authors:

J.H. Gülpen, A.A. Kodentsov, F.J.J. van Loo

Keywords:

Diffusion Couples, Growth, Integrated Diffusion Coefficient, Kinetic, Nickel Ni, Silicide, Silicon, Silicon Carbide (SiC)

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© 1994 Trans Tech Publications Ltd. All Rights Reserved

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