A Study of Defects in SiO2 Films on Si by Variable-Energy Positron Annihilation Spectroscopy

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Periodical:

Materials Science Forum (Volumes 175-178)

Edited by:

Yuan-Jin He, Bi-Song Cao and Y.C. Jean

Pages:

157-160

DOI:

10.4028/www.scientific.net/MSF.175-178.157

Citation:

M. Fujinami and N.B. Chilton, "A Study of Defects in SiO2 Films on Si by Variable-Energy Positron Annihilation Spectroscopy", Materials Science Forum, Vols. 175-178, pp. 157-160, 1995

Online since:

November 1994

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$35.00

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