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HomeMaterials Science ForumMaterials Science Forum Vol. 203Dual Ion Beam Deposition and Characterizatio of...

Dual Ion Beam Deposition and Characterizatio of TiO_x Thin Films

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Periodical:

Materials Science Forum (Volume 203)

Pages:

161-166

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.203.161

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Online since:

February 1996

Authors:

A. Rizzo, S. Cucurachi, L. Mirenghi, Silvia Scaglione, L. Vasanelli, E. Melissano

Keywords:

Chemical Bonds, Dual Ion Beam Deposition, TiO_x Optical Parameters, Titanium Oxide, X-Ray Photoelectron Spectroscopy (XPS)

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© 1996 Trans Tech Publications Ltd. All Rights Reserved

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