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Growth of Si:H Thin Films by Hot Filament CVD: μ-Crystalline to Amorphous Transition

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Periodical:

Materials Science Forum (Volume 203)

Pages:

167-172

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.203.167

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Online since:

February 1996

Authors:

R. Polini, V. Barbarossa, C. Minarini, A. Eray, A. Marucci, G. Mattei

Keywords:

Amorphous Silicon, Film Growth, Hot Filament-CVD, Microcrystalline Silicon, Raman Spectroscopy, Reflectance Spectroscopy

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© 1996 Trans Tech Publications Ltd. All Rights Reserved

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