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HomeMaterials Science ForumMaterials Science Forum Vols. 255-257Relaxation Behavior of...

Relaxation Behavior of Poly(methylphenylsilylenemethylene) at Low Temperature Studied by Positron Annihilation

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Periodical:

Materials Science Forum (Volumes 255-257)

Pages:

351-353

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.255-257.351

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Online since:

September 1997

Authors:

Takahito Suzuki, N. Oshima, E. Hamada, Toshio Ogawa, M. Murakami, Yasuo Ito

Keywords:

Low-Temperature, Poly(Methylphenylsilylenemethylene), Polymer, Positron Annihilation, Relaxation

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© 1997 Trans Tech Publications Ltd. All Rights Reserved

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