Relaxation Behavior of Poly(methylphenylsilylenemethylene) at Low Temperature Studied by Positron Annihilation

Abstract:

Article Preview

Info:

Periodical:

Materials Science Forum (Volumes 255-257)

Edited by:

Y. C. Jean, Morten Eldrup, David M. Schrader, Roy N. West

Pages:

351-353

DOI:

10.4028/www.scientific.net/MSF.255-257.351

Citation:

T. Suzuki et al., "Relaxation Behavior of Poly(methylphenylsilylenemethylene) at Low Temperature Studied by Positron Annihilation", Materials Science Forum, Vols. 255-257, pp. 351-353, 1997

Online since:

September 1997

Export:

Price:

$35.00

In order to see related information, you need to Login.