Direct Evidence of Fluorine-Related Defects in F+, BF+ and BF2+ Implanted Silicon by Positron Annihilation

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Periodical:

Materials Science Forum (Volumes 255-257)

Edited by:

Y. C. Jean, Morten Eldrup, David M. Schrader, Roy N. West

Pages:

683-685

Citation:

L. Liszkay et al., "Direct Evidence of Fluorine-Related Defects in F+, BF+ and BF2+ Implanted Silicon by Positron Annihilation", Materials Science Forum, Vols. 255-257, pp. 683-685, 1997

Online since:

September 1997

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$38.00

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