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HomeMaterials Science ForumMaterials Science Forum Vols. 282-283Nonequilibrium Plasmas for Material Processing in...

Nonequilibrium Plasmas for Material Processing in Microelectronics

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Advanced Materials and Processes: YUCOMAT '97

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Periodical:

Materials Science Forum (Volumes 282-283)

Pages:

47-56

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.282-283.47

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Online since:

May 1998

Authors:

Z.Lj. Petrović, T. Makabe

Keywords:

Capacitively Coupled Plasma, Inductively Coupled Plasma, Ionization, Ionization Energies, Plasma Chemistry, Plasma Deposition, Plasma Etching, Rf Discharges, Thin Film

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© 1998 Trans Tech Publications Ltd. All Rights Reserved

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