Comparison of the Morphological Effect for the Simulation of Abnormal Goss Grain Growth in Two Fe-3%Si Alloys, Grades Hi-B and CGO

Abstract:

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A grain growth simulation based on the concept of grain boundary migration driven by the radius curvature has been tested to study the abnormal grain growth (AGG) of the Goss grains in silicon steels in presence of particles. In the classical simulation of AGG, the grain size is generally assumed to be homogeneous. In order to introduce the influence of the morphological and crystallographic heterogeneities on AGG around the Goss grain, the simulation procedure has been implemented using as starting state an experimental microstructure characterized by Orientation Imaging Microscopy (OIMTM). Abnormal growth results are compared for the two grades, Hi-B and CGO of Fe-3%Si alloys. It has been notably shown that the large grains resist AGG so that the Goss grain shape becomes anisotropic.

Info:

Periodical:

Materials Science Forum (Volumes 467-470)

Edited by:

B. Bacroix, J.H. Driver, R. Le Gall, Cl. Maurice, R. Penelle, H. Réglé and L. Tabourot

Pages:

887-892

DOI:

10.4028/www.scientific.net/MSF.467-470.887

Citation:

N. Maazi et al., "Comparison of the Morphological Effect for the Simulation of Abnormal Goss Grain Growth in Two Fe-3%Si Alloys, Grades Hi-B and CGO", Materials Science Forum, Vols. 467-470, pp. 887-892, 2004

Online since:

October 2004

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Price:

$35.00

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