Etching Mask Effect of the Nanoscratched Borosilicate Surface and Its Application to Maskless Pattern Fabrication

Abstract:

The purpose of this study is to suggest a maskless pattern fabrication technique using the combination of machining by Nanoindenter® XP and HF wet etching. Sample line patterns were machined on a borosilicate surface by constant load scratch (CLS) of the nanoindenter with a Berkovich diamond tip, and they were etched in HF solution to investigate chemical characteristics of the machined borosilicate surface. After the etching process, the convex structure was made. On the basis of this fact, some line patterns with convex structures were fabricated.

• Periodical: Materials Science Forum (Volumes 475-479)
• Pages: 3479-3482
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.475-479.3479
• Online since: January 2005
• Authors: S.W. Youn, Chung Gil Kang
• Keywords: Etch-Mask Effect, HF Wet Etching, Hyper-Fine Pattern, Nanoscratch

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