Etching Mask Effect of the Nanoscratched Borosilicate Surface and Its Application to Maskless Pattern Fabrication

Abstract:

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The purpose of this study is to suggest a maskless pattern fabrication technique using the combination of machining by Nanoindenter® XP and HF wet etching. Sample line patterns were machined on a borosilicate surface by constant load scratch (CLS) of the nanoindenter with a Berkovich diamond tip, and they were etched in HF solution to investigate chemical characteristics of the machined borosilicate surface. After the etching process, the convex structure was made. On the basis of this fact, some line patterns with convex structures were fabricated.

Info:

Periodical:

Materials Science Forum (Volumes 475-479)

Main Theme:

Edited by:

Z.Y. Zhong, H. Saka, T.H. Kim, E.A. Holm, Y.F. Han and X.S. Xie

Pages:

3479-3482

DOI:

10.4028/www.scientific.net/MSF.475-479.3479

Citation:

S.W. Youn and C. G. Kang, "Etching Mask Effect of the Nanoscratched Borosilicate Surface and Its Application to Maskless Pattern Fabrication", Materials Science Forum, Vols. 475-479, pp. 3479-3482, 2005

Online since:

January 2005

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Price:

$35.00

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