Characteristics of SnOx-Coated Lithium Manganese Oxide Thin Film for MEMS Power System

Abstract:

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We prepared spinel-phase LiMn2O4 layer by using rf magnetron sputtering system. LiMn2O4 films were deposited at room temperature and then annealed at 750°C for crystallization to spinel type. In order to reduce the interface reaction such as Mn dissolution phenomenon during operation, we introduced SnOx (coating-layer) thin film. The SnOx films were deposited on LiMn2O4 films by rf magnetron sputtering system. A SnOx-coated LiMn2O4 film was more stable during the chargingdischarging reaction and maintained good cycle behavior at high temperature conditions of 55°C.

Info:

Periodical:

Materials Science Forum (Volumes 486-487)

Edited by:

Hyung Sun Kim, Sang-Yeop Park, Bo Young Hur and Soo Wohn Lee

Pages:

562-565

DOI:

10.4028/www.scientific.net/MSF.486-487.562

Citation:

J. H. Lee et al., "Characteristics of SnOx-Coated Lithium Manganese Oxide Thin Film for MEMS Power System", Materials Science Forum, Vols. 486-487, pp. 562-565, 2005

Online since:

June 2005

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Price:

$35.00

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