Electrochemical and Structural Properties of Si/Ni/Cu Electrode Films Fabricated with Different Methods

Abstract:

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Si film electrodes for Li micro-film batteries were fabricated on a Cu substrate and a Ni/Cu film. In the structural properties, Si film had an amorphous structure, while the crystallinity of Ni buffer film was improved after annealing. FE-SEM observation demonstrated differences in surface morphologies of Si films fabricated with different methods. In the electrochemical properties, the Ni-inserted film showed the largest initial charge and discharge capacity, and the cell with annealed Si/Ni/Cu film showed good cycleability. It is believed that the insertion of Ni film as a buffer film improved the charge and discharge capacity owing to the enhancement of adhesion between Si film and Cu substrate.

Info:

Periodical:

Materials Science Forum (Volumes 510-511)

Edited by:

Hyung Sun Kim, Yu Bao Li and Soo Wohn Lee

Pages:

266-269

DOI:

10.4028/www.scientific.net/MSF.510-511.266

Citation:

G. B. Cho et al., "Electrochemical and Structural Properties of Si/Ni/Cu Electrode Films Fabricated with Different Methods", Materials Science Forum, Vols. 510-511, pp. 266-269, 2006

Online since:

March 2006

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Price:

$35.00

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