Comparison of Silicon Coatings Deposited by Vacuum Plasma Spraying (VPS) & Atmospheric Plasma Spraying (APS)

Abstract:

In this work, silicon coatings were deposited using VPS and APS technologies. Their structure and composition were characterized using XPS, SEM, and XRD. The porosity and surface-roughness of coatings were evaluated. The results showed that the VPS silicon coating possessed lower porosity compared with the APS silicon coating. The APS silicon coating surface was almost all covered by many small particles whose size is about 100 nm. The Si 2p XPS spectra indicated that silicon oxide existed in both coatings. The oxidation may have occurred during the plasma spray process. However, the VPS process could inhibit silicon from being oxidated.

• Periodical: Materials Science Forum (Volumes 510-511)
• Pages: 802-805
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.510-511.802
• Online since: March 2006
• Authors: Ya Ran Niu, Xuan Yong Liu, Chuan Xian Ding
• Keywords: APS, Plasma Spraying, Silicon Coating, VPS

References

[1] D. Matejka, B. Benko Plasma Spraying of Metallic and Ceramic Materials (John Wiley & Sons Ltd, Czechoslovakia, 1989).

[2] R. Suryanarayanan, Plasma SprayingTheory and Applications (World Scientific Publications, Singapore, 1993).

[3] Schropp, Ruud E. I., Zeman, Micro Amorphous and Microcrystalline Silicon Solar Cells: Modeling, Materials, and Device Technology (Kluwer Academic, Boston, 1998).

DOI: 10.1007/978-1-4615-5631-2

[4] Nalwa, Hari Singh Silicon-based Material and Devices (Academic Press, 2001 London).

[5] E. Mello Ceresa, F. Garbassi: Materials Chemistry and Physics 9 (1983), pp.371-385.