Growth of ZnO Thin Films by Metalorganic Chemical Vapor Deposition Using Isopropyl Alcohol for Oxygen Precursor
ZnO thin films were synthesized by metalorganic chemical vapor deposition on Al2O3 (0001) substrates particularly using isopropyl alcohol for oxygen precursor. Change in microstructure was investigated depending on the growth temperature and the O/Zn precursor ratio. Under an optimized condition, ZnO thin films having a very smooth surface and dense cross-sectional microstructure were obtained while possessing epitaxial crystalline alignment. However, the photoluminescent spectrum lacks the band-edge emission.
Hyung Sun Kim, Yu Bao Li and Soo Wohn Lee
J. Y. Park et al., "Growth of ZnO Thin Films by Metalorganic Chemical Vapor Deposition Using Isopropyl Alcohol for Oxygen Precursor", Materials Science Forum, Vols. 510-511, pp. 998-1001, 2006