Growth of ZnO Thin Films by Metalorganic Chemical Vapor Deposition Using Isopropyl Alcohol for Oxygen Precursor

Abstract:

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ZnO thin films were synthesized by metalorganic chemical vapor deposition on Al2O3 (0001) substrates particularly using isopropyl alcohol for oxygen precursor. Change in microstructure was investigated depending on the growth temperature and the O/Zn precursor ratio. Under an optimized condition, ZnO thin films having a very smooth surface and dense cross-sectional microstructure were obtained while possessing epitaxial crystalline alignment. However, the photoluminescent spectrum lacks the band-edge emission.

Info:

Periodical:

Materials Science Forum (Volumes 510-511)

Edited by:

Hyung Sun Kim, Yu Bao Li and Soo Wohn Lee

Pages:

998-1001

DOI:

10.4028/www.scientific.net/MSF.510-511.998

Citation:

J. Y. Park et al., "Growth of ZnO Thin Films by Metalorganic Chemical Vapor Deposition Using Isopropyl Alcohol for Oxygen Precursor", Materials Science Forum, Vols. 510-511, pp. 998-1001, 2006

Online since:

March 2006

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Price:

$35.00

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